Deionized water drying lamp

Mon, 22 Jun 2026 18:39:10 +0800

On the fab floor, one water mark can kill a whole lot after lithography. Conventional drying drifts in temperature, and particles ride off hot surfaces straight into the film. We built deionized water drying lamps to lock out that variability. Short-wave infrared hits the water film fast, heating the surface without overshooting the resist. It dries wafers clean and keeps soft bake and hard bake inside a tight thermal budget. What matters under the hood Short-wave infrared cuts through the water film quickly. The quartz envelope and reflector geometry keep the heat where it needs to be. You get wafer-level uniformity within ±0.1°C and repeatable setpoint control for photoresist bake. The system runs in Class 1–100 cleanrooms. The heated zone generates zero particles, and there’s no outgassing to contaminate the resist. Power density is tuned to drive evaporation without blowing past photoresist thermal limits. Lamp output stays stable around the clock, and we’ve seen units run 5,000+ hours with under 5% drop. Why it plays in production In-line, the lamp swaps out slower convection steps and hot plates that drift. Wafers dry faster, and contact angle holds steady across the lot. Photoresist profiles repeat run-to-run. The payoff is fewer reworks, less scrap, and stable critical dimension control. Energy use drops because we heat the water and wafer, not the air around them. Replacement intervals stretch out, and maintenance windows shrink, thanks to a design that avoids moving parts and heavy thermal mass. What to watch for Installation means matching the lamp to the tool’s aperture, power supply, and cooling path. Check voltage and connector compatibility, and make sure the lamp’s thermal profile lines up with your existing recipe. The lamp performs best when the wafer surface chemistry is under control. Trace surfactants can shift drying dynamics, so manage those upstream.

Water on Warm IR Heaters for Home

Deionized water drying lamp